Dettagli sull'Insegnamento per l'A.A. 2018/2019

Prerequisiti

The student must have basic notions in electronics and physics, contained in the exams of Physics I and Elettronica I.

Obiettivi

The goal of this course is to provide the main concepts on micro and nano electronic technologies. Also general concepts on CMOS technology and imagers, discrete PCB design and implementation and thermal aspects are provided. On successful completion of this module, the student should understand the fundamental concepts and theoretical aspects of micro and nano technologies fabrication process.

Sillabo

• Introductory Elements: vacuum and plasma.
• Lithography: Polysilicon, Deposition by Chemical Vapor Deposition (CVD), mechanism of the process, systems for CVD deposited films, Plasma Enhanced Chemical Vapor Deposition, Copper film
• Photolithography: process, resist, limitations, wet etching, dry etching, Reactive Ion Etching, problems of various processes, Chemical Mechanical Polishing, Diffusion. Ionic implantation
• Future developments in technologies: electrical measurements, optical microscopy and chemical analysis
• CMOS technology and imagers: the theory of color, quality image and image processing algorithms
• Memories: Up to date technologies in advanced memories design, structure and basic devices
• Discrete electronic technologies: Printed Circuit Board design and implementation and thermal aspects

Descrittori di Dublino

Alla fine del corso, lo studente dovrebbe

Testi di riferimento

• S.M. Sze, Semiconductor devices: physics and technology , J. Wiley and Sons . 2002.    

Modalità d'esame

Oral exam.

Aggiornamenti alla pagina del corso

• A.A. 2012/2013
• A.A. 2013/2014
• A.A. 2014/2015
• A.A. 2015/2016
• A.A. 2016/2017
• A.A. 2017/2018
• A.A. 2018/2019
• A.A. 2019/2020